Experimental plasma cleaning machines are core pre-treatment equipment in laboratories for materials, semiconductors, microelectronics, biomedicine, and more. The core of model selection lies in matching sample characteristics, experimental precision, space, and budget. As a mainstream brand of laboratory plasma equipment in China, Plaux offers a product line covering three categories: small desktop vacuum, medium-sized R&D, and atmospheric jet. Below, we present a comprehensive model selection plan from three aspects: core dimensions, model matching, and common selection pitfalls.
1. Determine the core first: vacuum type vs atmospheric type (the two main routes of Prolex)
1. Vacuum plasma cleaning machine (Plexus PM/PR/PLUTO series) - the first choice for laboratories
Applicable scenarios:
Semiconductor wafers, lead frames, chips, and precision electronic components
Metals (copper / aluminum / 42 alloy), ceramics, glass, polymer films
Medical catheters, implantable devices, and biomaterials (with high cleanliness requirements)
Nanoscale cleaning, surface activation, etching, and graft modification
Advantage:
In a vacuum environment (10–100Pa), the plasma is uniform and stable, with no dead zones and no oxidation
Capable of processing multiple gases such as O₂/Ar/N₂/CF₄, with flexible processes
With a cleaning depth reaching the nanoscale, it is suitable for high-demand research and development as well as small-batch sample testing
Representative models of Pulesi: PM-T5L (5L tabletop), PR-80LW, PLUTO-30 (10–30L) Kunshan Pulesi Electronic Technology Co., Ltd
2. Atmospheric (atmospheric pressure) plasma cleaning machine (Pulesi SZ/PLAUX series) - rapid online/local processing
Applicable scenarios:
Activation before printing/bonding of plastics, rubber, cables, local solder joints on PCBs
Intolerance to vacuum, large size, continuous samples, small-scale production line testing
Advantage:
No need for vacuuming, ready to use upon startup, high efficiency
Small in size, mobile, and suitable for fixed-point/local processing. Kunshan Pulesi Electronic Technology Co., Ltd
Representative models of Pulesi: SZ-30 Jet, PLAUX-CTP-2000 Quasi-Glow Kunshan Pulesi Electronic Technology Co., Ltd
Selection conclusion:
R&D laboratory, material characterization, semiconductor/medical samples → vacuum type is a must
Only for surface activation, not resistant to vacuum, continuous online → choose atmospheric type
II. According to sample and experimental requirements: 5 key selection dimensions
1. Cavity size and volume (the most basic)
The Pulesi experimental models are divided into the following categories based on their cavity types:
5L small desktop (PM-T5L/PR-T5L)
Cavity: Φ140–160mm × D250–270mm
Suitable for: samples <6cm, chips, small wafers, small parts, thin sheets
Space: Small footprint (~550×460×520mm), suitable for clean benches / desktops. Kunshan Pulesi Electronic Technology Co., Ltd
10–30L medium-sized research and development (PM-20L/PLUTO-30)
Cavity: 280×280×200mm or larger
Suitable for: 8-inch inner wafers, multiple batches of small parts, and larger-sized samples
Capacity: Capable of accommodating multiple layers of sample racks at once (adjustable from 1 to 8 layers)
Selection principle:
The maximum size of the sample + 10%–20% reserved space to ensure uniform plasma surrounding
2. Chamber material (determining cleanliness and corrosion resistance)
Standard / Optional:
316L stainless steel (standard)
Resistant to corrosion and fluorine-containing gases, with a long service life
Suitable for: semiconductor, metal, and routine medical experiments
Quartz / Ceramic Lining (Optional)
No metal contamination, ultra-high cleanliness
Suitable for: optical lenses, high-purity wafers, biological materials, and applications requiring no impurities
Aluminum alloy (introductory)
High cost-effectiveness, suitable for regular O₂/Ar cleaning, not resistant to fluorine gas
3. Power supply and power (determining processing intensity)
frequency
13.56MHz (RF, mainstream in Prolex): good uniformity, suitable for high precision, modification/etching. Kunshan Prolex Electronic Technology Co., Ltd
40kHz (intermediate frequency): low cost, suitable for conventional cleaning and activation
Power:
Small experiment: 200W (PM-T5L standard configuration, adjustable from 0–200W) → meets the needs of most R&D projects at Kunshan Pulesi Electronic Technology Co., Ltd
Medium / Strong processing: 500–750W (PLUTO-30) → suitable for thick oxide layers and large samples
Matching device: The Pulesi experimental machine comes standard with an automatic matching device, ensuring stable power output and repeatable experiments under different loads
4. Gas control system (process flexibility)
MFC Mass Flow Controller:
Standard configuration: 1 channel (O₂ or Ar), scalable to 2–4 channels of MFC
Accuracy ±1%, supports gas mixing (such as Ar+O₂, N₂+H₂)
Vacuum pump assembly:
Small type: Two-stage rotary vane pump, with fast pumping speed (30Pa<90 seconds)
High requirements: optional molecular pump (ultra-high vacuum, suitable for semiconductors/optics)
5. Control system and function (essential for laboratories)
Standard configuration of PULSE experimental model:
7-inch/4.3-inch touch screen, Chinese interface, automatic/manual dual mode
Parameter storage: 30–50 sets of process formulas, one-click access
Safety protection: overvoltage, overcurrent, overtemperature, gas leakage alarm, door interlock
Optional: temperature monitoring, water cooling (using thermosensitive materials), remote control
III. Key points for avoiding pitfalls in laboratory selection
Don't blindly pursue large cavities
Using a large chamber for a small sample → slow pumping, gas waste, and reduced uniformity
The power is not necessarily the greater, the better
Thermal sensitive materials (plastics, films) → Low power (<200W) + low temperature mode
Metal / Ceramic → Suitable for medium and high power applications
Gas circuits are allocated as needed
Basic cleaning: One line of O₂/Ar is sufficient
Modification/Etching: At least 2–3 MFC channels
Attach importance to after-sales service and consumables
Pulesi Yangtze River Delta (Kunshan) original factory, 24-hour response
Core consumables: electrodes (500–1000h), sealing rings, pump oil → choose models that are easy to replace and have low cost
IV. Summary: Three Steps to Choose the Right PULS Experimental Machine
Type: High cleanliness/precise sample → Vacuum type; Rapid/local → Atmospheric type
Cavity volume: 5L (small sample) / 10–20L (medium sample / batch)
Fixed configuration: stainless steel/quartz, 200–500W, 1–4 MFC channels, automatic control
