On the path of continuous innovation and technological depth, Kunshan Plaux Electronic Technology Co., Ltd. has taken another solid step forward. We are pleased to announce that the "Wide-Span Atmospheric Plasma Jet System", independently developed by our company, has been officially granted a utility model patent by the China National Intellectual Property Administration. This not only represents a significant expansion of our intellectual property portfolio but also delivers an innovative solution tailored to the "large-area, continuous" surface treatment demands in industrial manufacturing.
A Three-Fold Upgrade in Efficiency, Uniformity, and Flexibility
1. Wide-Span Design for Efficient Coverage
The core innovation of this patented system lies in its unique wide-span plasma jet generation device. It produces a stable, uniform, large-area low-temperature plasma beam, significantly increasing the treatment width in a single pass. This fundamentally transforms the traditional operation mode that requires repeated scanning with spot or narrow-width plasma jets, bringing disruptive efficiency improvements for conveyor line integration and large-area material processing.
2. Operation at Atmospheric Pressure Enables Continuous Production
As a highly integrated application of atmospheric pressure plasma technology, this system operates without the need for a vacuum chamber. It can be directly integrated into existing production lines, enabling "inline" continuous processing. This greatly simplifies the process flow, reduces material handling, and provides robust technical support for customers to achieve uninterrupted, high-efficiency, and low-cost large-scale production.
3. Precise, Uniform Treatment Ensures Superior Quality
Through precise fluid dynamics and electric field design, the patented technology ensures high uniformity and stability of plasma distribution across the entire wide span. This means that whether the task is surface cleaning to remove organic contaminants or activation to enhance material adhesion, the treated materials achieve consistent, reliable, and high-quality results, laying a solid foundation for subsequent processes.
Upholding the Innovation Engine to Drive Value Creation
The acquisition of this patent is a vivid reflection of Plaux's commitment to its R&D-driven, technology-first values. It originates from our deep understanding of customer process challenges and relentless exploration of plasma technology frontiers. Each addition to our patent portfolio serves as a cornerstone in building our technological moat and consolidating our industry leadership.
From vacuum plasma treatment for precision components to the current atmospheric, continuous processing of large-format materials, Kunshan Plaux remains dedicated to expanding the application boundaries of plasma technology. With a diversified portfolio of innovative products, we aim to meet the increasingly complex and evolving manufacturing needs of our global customers.
