Low Temperature Plasma Ashing

Description of low temperature plasma ashing Equipment Name: Plasma Processing Equipment Equipment Model: PR160L Machine weight: about 500KG Rated power: 5KW low temperature plasma ashing power supply: AC-380V/three-phase five-wire The overall specifications: 1560mm (W) × 1100mm (D) × 1740mm (H)...

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Description of low temperature plasma ashing

Equipment Name: Plasma Processing Equipment

Equipment Model: PR160L

Machine weight: about 500KG

Rated power: 5KW

low temperature plasma ashing power supply:AC-380V/three-phase five-wire

The overall specifications: 1560mm (W) × 1100mm (D) × 1740mm (H)

Vacuum chamber specifications: 750mm (W) × 600mm (D) × 450mm (H) imported aluminum

Electrode plate specifications: 738mm (W) × 450mm (D), 10 layers

Bracket mode: custom aluminum bracket structure

Capacity: According to product specifications

Processing time: different process, different processing time

Plasma generator power: imported MKS0-600W, domestic radio frequency 13.56MH z, 0-1000W adjustable

Vacuum Pump System: Imported Mechanical Vacuum Pump Unit

Vacuum Measurement System: High Precision Vacuum Gauge

Working vacuum: 20-80Pa

Vacuum pump limit pressure: 5.0×10-1Pa

Vacuum time: ≤120S

Breaking vacuum time: 30S

Gas supply method: solenoid valve type

Flowmeter adjustment range: 0-500Sccm (ml/min)

Input air pressure monitoring system: 2 air pressure decompression tables, 2 gas mass flow meters

Operation method: manually take and place the workpiece, start automatic control with a key

Using of low temperature plasma ashing:

Different combinations are used for different process manufacturing. They are used exclusively in Diebond pre-cleaning, Molding pre-cleaning, Wafer surface cleaning and other processes in the semiconductor field.


Company of low temperature plasma ashing:

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Package of low temperature plasma ashing:

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