Reactive Ion Etching

Description of reactive ion etching Equipment Name: Plasma Processing Equipment reactive ion etching Model:PM40L reactive ion etching weight: about 200KG Rated power: 3KW Machine power supply: AC-380V/three-phase five-wire The whole specification: 800mm(W)×900mm(D)×1400mm(H) Vacuum chamber size:...

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Description of reactive ion etching

Equipment Name: Plasma Processing Equipment

reactive ion etching Model:PM40L

reactive ion etching weight: about 200KG

Rated power: 3KW

Machine power supply: AC-380V/three-phase five-wire

The whole specification: 800mm(W)×900mm(D)×1400mm(H)

Vacuum chamber size: 350mm(W)×400mm(D)×300mm(H)

Capacity of reactive ion etching: According to product specifications

Processing time: different process, different processing time

Plasma generator power: 40KHz

Vacuum pump system: mechanical oil rotary vane vacuum pump

Vacuum Measurement System: Pirani Vacuum Gauge

Working vacuum degree: 20-60Pa

Vacuum pump limit pressure: 4.0×10-1Pa

Vacuum time: ≤50S

Breaking vacuum time: 20-40S

Gas supply method: solenoid valve type

Flowmeter adjustment range: 0-300Sccm (ml/min)

Input air pressure monitoring system: 2 air pressure decompression tables, 2 gas mass flow meters

Operation method: manually take and place the workpiece, start automatic control with a key

Using of reactive ion etching:

different combinations for different process manufacturing, can be used for devices, metal-based workpieces, ceramics, glass and other workpiece surface cleaning, modification and so on.


Company of reactive ion etching:

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Package of reactive ion etching:

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